Tel-Aviv University combines new Ion-Line with Raith 150 for advanced nano prototyping
AVBA Hitech Services - a leading provider of scientific equipment in Israel and Raith GmbH - a leading manufacturer of Nano-Structuring and Lithography systems, announced today the installation of a novel solution based on Raith’s successful E-Line Electron Beam Lithography systems and their novel Nano-FIB ion source and focused ion optics, at The Center for Nanoscience and Nanotechnology, Tel Aviv University, Israel. TAU will use the new ionLiNE - ion beam lithography system (IBL) to develop and extend its existing EBL facilities for advanced nano-prototyping applications.
EBL has been the benchmark for Nano-prototyping research for many years – combining speed with the established resist based nano-fabrication processing required for advanced research. By adding the complimentary technique of ion beam lithography, we will be able to extend the capabilities of our lithography process beyond the conventional limits, and investigate novel processes, giving higher levels of performance, both with and without the use of resist. The TAU Center for Nanoscience and Nanotechnology serves many collaborative partners within the University and external to it.
IBL is the natural compliment to EBL, adding automated three dimensional patterning, but while utilising all the standard design tools and layer patterning processes that are well understood for EBL. In addition to the delivery of one of the first ionLiNE IBL instruments, TAU and Raith have signed a joint development agreement to develop new IBL protocols for nano-prototyping applications for this emerging technique.’ said Ori Chevnovsky, head of the The Center for Nanoscience and Nanotechnology at TAU.
This is the first time that applications which do not require ion beam imaging as the first step, such as small wafer level patterning, automated nanometer precision pattern placement and large area pattern stitching, which are effectively unknown within the conventional ion beam community, may be routinely performed. IBL solves these problems by applying true and tested, write field stitching capabilities, made possible by laser interferometer stage technology, to the versatile and direct write technique of ion beam patterning’ said Lloyd Peto – Senior sales manager for ion beam lithography at Raith GmbH.
About Tel Aviv University Center for Nanoscience and Nanotechnology The TAU Center for Nanoscience and Nanotechnology (TAU-NST) was established in 2000 to support nano related research across four faculties (Exact Sciences, Engineering, Life Sciences and Medicine). The centre provides the intellectual framework to catalyze interdisciplinary research, supported by the physical infrastructure, vital for nurturing leading-edge activities. The central facility of the center encompasses state of the art equipment for construction, realization and general characterization of nano-structures. More than 50 researchers distributed in the above four faculties are affiliated with the center. In addition to its primary research activities, the Center supports education programs in nanoscience, hosts visiting scientists, and promotes contacts and collaborations with granting agencies and with advanced technology industries.
About Raith GmbH Raith is an independent high technology enterprise, which, develops, sells and supports products to an international client base. The company has pioneered products for new markets, creating innovative solutions and enabling leading edge innovation in technology. Raith offers complimentary solutions for nanolithography and fabrication with emphasis on R&D and small batch production for growing markets. Raith is a partner for our customers within the academic community, semiconductor industry, microsystems technology and original equipment manufacturers(OEM).
July, 2009
Raith Users Group Meeting in Israel
The Israeli Second Raith Users Group Meeting took place in Ben-Gurion University of the Negev (BGU), on July 14th.
The meeting was organized by A.V.B.A Hitech Services Ltd., The Raith Agent in Israel, with the assistance of Mr. Benny Hadad and Dr. Adi Goldberg from BGU. The meeting started with interesting presentation of Mr. Dirk Bruggemann about the last Raith developments. Later on, The Raith users presented the work is done on their systems, described procedures of certain applications, gave hints to the other participants and replied their question.
Before the noon break Mr. Dirk Bruggemann – Raith Sales Director and Mr. Victor Orland – A.V.B.A. CEO gave a present to Dr. Yigal Lilach from HUJI who won with Dr. Uriel Levi’s research group the second prize of the Raith Micrograph Award 2008. The prize was Sony Vaio mini laptop.
The meeting ended with excellent presentation of Mr. Dirk Bruggemann about global Raith users special applications. This presentation was a basis for further applications discussions and opened the door for scientific collaborations with worldwide scientific groups. In the end of the meeting everybody agreed it was very important meeting and we decided that the next meeting, next year, will be in the Technion Institute of Science.
March, 2009
Since the beginning of March 2009 AVBA represents PANalytical B.V. in Israel.
PANalytical is the world's leading supplier of analytical instrumentation and software for X-ray diffraction (XRD) and X-ray fluorescence spectrometry (XRF), with more than half a century
of experience. The materials characterization
equipment is used for scientific research and development, for industrial process control
applications and for semiconductor metrology.
PANalytical was founded in 1948 as part of Philips and was formerly known as Philips Analytical. It employs around 1,000 people worldwide and has its headquarters in Almelo, the Netherlands.
The product portfolio includes a broad range of XRD and XRF systems and software widely used for the analysis and materials characterization of products such as cement, metals and steel, nanomaterials, plastics, polymers and petrochemicals, industrial minerals, glass, catalysts, semiconductors, thin films and advanced materials, pharmaceutical solids, recycled materials and environmental samples.
For AVBA, PANalytical’s products are complementary to our current scientific product line.
March 2009
Since December 2008 AVBA represents Qualiflow Therm in Israel.
Qualiflow Therm (JIPELEC) is a leading supplier of RTP and CVD equipment for niche applications for the semiconductors, microsystems and solar cells industries.
Qualiflow Therm (JIPELEC) RTP product portfolio includes Low cost bench top RTP processor (JetFirst), Versatile RTP processor to transfer a process from development to production (JetStar), SEMI-MESC compatible Rapid Thermal Processing cluster module for wafer sizes up to 200 mm diameter (JetClip), low temperature Rapid Thermal Annealing (RTA) system utilizes a high power ultraviolet source to assist annealing process (JetClip sg), SiC Furnace RTP (SiC Furance), low cost tubular furnace for thermal and LPCVD processes (TubeStar), dedicated tool for process development on PECVD SiN processes for solar cell applications (PlasmaStar PECVD System) and fractionated vaporization system for MOCVD (DuoVap).
JIPELEC RTP systems are installed in leading laboratories in Israel like the Technion, Ben-GurionUniversity and Rafael.
The Israeli Second Raith Users Group Meeting took place in Ben-Gurion University of the Negev (BGU), on July 14th. 
Before the noon break Mr. Dirk Bruggemann – Raith Sales Director and Mr. Victor Orland – A.V.B.A. CEO gave a present to Dr. Yigal Lilach from HUJI who won with Dr. Uriel Levi’s research group the second prize of the Raith Micrograph Award 2008. The prize was Sony Vaio mini laptop. 
