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Lithography

  • Micro and nanopatterning with electron beam lithography for research & development and small batch production.
  • Front-end and back-end wafer as well as IC inspection in the semiconductor industry
  • Lithography solutions for manufacturing and replication of advanced micro- and nano- scale structures.
  • Definition of planar geometries and for surface diagnostics, in applications where maximum resolutions down to 0.7 µm are required by transforms a laser beam into a controlled writing tool for photolithographic mask fabrication or for direct in situ processing on planar substrates.

 

e-Beam Lithography Systems

Micro and nanopatterning with electron beam lithography for research & development and small batch production

Ion Beam lithography Systems

An Ion Beam Lithography system for nanofabrication and nanoengineering, for low dose applications in surface science, thin film engineering and applied physics research.

Laser Lithography Systems

The LaserWriter system is designed for the definition of planar geometries and for surface diagnostics, in applications where maximum resolutions down to 0.7 µm are required.
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