EITRE® - Nano Imprint Lithography systems for Research & Development
The EITRE® Nano Imprint Lithography (NIL) series offer a flexible and cost efficient lithography solution. The systems are suitable for Research & Development purposes allowing replication of patterns in the micro- and nanometer range.

EITRE® offers a complete range of imprint methods, including thermal NIL, hot embossing, UV NIL, as well as Obducat's proprietary Simultanous Thermal and UV (STU®) imprint process.

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