Corial D250L PECVD system
The Corial D250L PECVD tool is designed for low volume production over a wide range of applications for specialty semiconductor markets.

The Corial D250L is based on CORIAL’s unique reactor design. It houses an isothermal, pressurized reactor within a vacuum vessel, which is different from conventional PECVD reactors with heated substrate holders. Featuring a next-generation gas showerhead and symmetrical pumping, the Corial D250L delivers excellent deposition uniformity for a wide variety of applications.

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