Corial 210D ICP-CVD system
The Corial 210D ICP-CVD system is ideal for R&D centers, and offers a wide range of applications for the specialty semiconductor markets.

The Corial 210D high density plasma system is based on CORIAL’s latest generation of 2 MHz helical ICP reactor. It is equipped with separate gas injection for SiH4 and dopants, to deposit high quality SiO2, Si3N4, SiOCH, SiOF, SiC and aSi-H films at low temperature (<150°C)

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