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Lithography |
e-Beam Lithography Systems |
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e-beam tools for mask, reticle, and direct-write lithography, from high volume production to advanced research and development of NIL, photonic crystals, and sub-10 nanometer linewidths. |
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Lithography and Nanoengineering system (Mainly for R&D)
Nanotech R&D requires versatile and flexible instruments. State of the art performances, multi user management, instrument reliability and ease of operation are the critical requirements. Automation is mandatory for small batch applications. |
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ELPHY nanolithography systems for your SEM, FIB or SEM-FIB.
To complement the upgrade we may also offer Laserinterferometer stages. |
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